Rhosonics at SEMICON 2025: Advancing IC Manufacturing with Ultrasonic Sensors

At the IC Industry Chain International Forum during SEMICON 2025, our Global Sales Manager Ebru Arslan took the stage to present innovative insights into improving process efficiency with non-invasive ultrasonic sensors. Her talk, held on March 27, 2025, highlighted how ultrasonic technology—specifically Rhosonics’ Chemical Concentration Meter (CCM)—is transforming Semiconductor manufacturing.

How the Rhosonics CCM Benefits the Semiconductor Industry
The CCM is a cutting-edge, non-invasive ultrasonic sensor designed to measure chemical concentrations in real-time. Unlike traditional methods that rely on sampling and offline analysis, the CCM provides continuous monitoring without process interruptions.

For the Semiconductor industry, this means:
Enhanced Process Control – Ensures consistent chemical concentrations in etching, cleaning, and CMP slurry processes.
Cost Savings – Reduces chemical waste and optimizes chemical usage, lowering production costs.
Sustainability – Eliminates the need for excess dilution and unnecessary chemical transport, significantly reducing carbon footprint.
High Accuracy & Reliability – Provides precise measurements, even in complex multi-chemical solutions.

Why It Matters for IC Manufacturing
Maintaining the right chemical composition is crucial in Semiconductor fabrication. Whether in etching, CMP, or cleaning steps, fluctuations in chemical concentrations can lead to defects, increased costs, and inefficiencies. The Rhosonics CCM ensures stable, accurate control, helping manufacturers improve yield rates, reduce downtime, and enhance overall process efficiency.

Let’s Connect!
Interested in learning how the Rhosonics CCM can optimize your Semiconductor processes? Contact us today to discuss how our ultrasonic sensor solutions can help improve efficiency and sustainability in your operations.

Want to have frequent updates on our products? Then please subscribe to our newsletter or follow us on LinkedIn.