SEMICONDUCTOR

Rhosonics’ ultrasonic technology provides a better overseeing of the process by monitoring multiple chemical concentrations simultaneously in real-time. The choice of technology depends on the amount of concentrations in a chemical solution that needs to be measured. Rhosonics can reach a measurement accuracy of up to ± 0.0001 wt%. It is worth mentioning some of the main chemicals or chemical concentrations where the Rhosonics technology can be used for:

Cleaning and Polishing: CMP Slurry, H2O2, HF, NH3, BHF, KOF , HNO3, SC1, SC2, APM, Piranha Solution, HCl, C6H8O7:H20, Aqua regia, Iodine Solution, HCl, HNO3, C3H8O (IPA), C3H6O (Acetone), (CH3)2CHOH, APM

Photoresist and Stripping: TMAH, TMAH + PR + CO3, H2SO4:H2O2, SPM, H2Ta2O6, Dimethyl Sulfoxide (DMSO), CeO2

Etching: TMAH, TMAH + PR + CO3,TBHA, H2SO4, HF, HNO3, KOH, C2HCl3, HNA

It is possible to virtually measure any type of chemicals or solid solutions in production processes using the Rhosonics ultrasonic technology. Apart from the semiconductor applications, solar panels and flat-panel displays have similar processes where the Rhosonics technology can also be applied.

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chemical concentration meter

Get in touch with Rhosonics for further information. If you want to learn more about our applications, then please also check our client cases and webinars.